---
id: "entity-asml"
type: "entity"
entityType: "organization"
canonicalName: "ASML"
aliases: []
source_timestamps: ["00:16:11"]
tags: ["semiconductors", "equipment"]
related: ["concept-euv-helium-consumption", "concept-chinese-native-chip-stack"]
url: "https://www.asml.com"
sources: ["s50-helium-48-days"]
sourceVaultSlug: "s50-helium-48-days"
originDay: 50
---
# ASML

The Dutch sole manufacturer of Extreme Ultraviolet (EUV) lithography machines — a global monopoly for the equipment essential to producing chips at <5nm nodes.

The speaker notes that Chinese domestic helium production (Guangdong plant) has recently achieved the **6N (99.9999%) purity certification** required to supply ASML lithography machines — a key milestone in [[concept-chinese-native-chip-stack]] development.

EUV machine operation is the source of the exponential helium demand described in [[concept-euv-helium-consumption]]: a single 300mm EUV fab consumes 5,000–20,000 m³ of helium per month for vacuum leak detection.